Wow! eBook
Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics
Author(s): Fuccio Cristiano (Editor), Antonino La Magna
- Publisher: Woodhead Publishing
- Publication Date: May 7, 2021
- Edition: 1st
- Language: English
- Print length: 426 pages
- ISBN-10: 0128202556
- ISBN-13: 9780128202555
Book Description
- Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena
- Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations
- Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors
Editorial Reviews
Review
Laser annealing is a materials fabrication tool that allows users to focus heating with nanometer resolution and locally modify materials properties for nanoscale materials
About the Author
His research interests concern the investigation of advanced doping techniques in semiconductors (with special focus on ultra-rapid thermal processes) and the impact of process-related defects on dopant activation anomalies. He has authored or coauthored about 130 papers in scientific journals and has given several invited presentations on Ion beam induced defects in silicon.
Antonino La Magna received his master’s in physics (cum laude) and his Ph.D. in Physics at the University of Catania in1992 and 1996, respectively. Since 1999, he has been a member of the permanent staff at the Institute for the Microelectronics and Microsystems of the Italian National Council of Research (CNR-IMM), where he is responsible of the computational team and resources (1999-Today). Currently, he also leads the research group on advanced processes (2010-Today). He is and has been coordinator and responsible for the CNR-IMM of several international projects and contract research on behalf of industry.
He has authored over more than 270 publications in international journals in the fields of theoretical solid state physics, technological processes and process and device simulations, and he is a frequently invited speaker at international conferences.
