Wow! eBook
ULSI Technology
Author(s): C. Y. Chang (Author)
- Publisher: McGraw-Hill Higher Education
- Publication Date: 1 Oct. 1996
- Language: English
- Print length: 640 pages
- ISBN-10: 0071141057
- ISBN-13: 9780071141055
Book Description
This text follows the tradition of Sze’s highly successful pioneering text on VLSI technology and is updated with the latest advances in the field of microelectronic chip fabrication. Since computer chips are foundations of modern electronics, these topics are essential for the next generation of USLI technologies, allowing more transistors to be packaged on a single chip. Contributing to each chapter are industry experts, specializing in topics such as epitaxy with low temperature process, rapid thermal processes, low damage plasma reactive ion etching, fine line litography, cleaning technology, clean room technology, packing and reliability.
Editorial Reviews
From the Publisher
– Whole chapter concerned with clean room engineering, or dust free environments.
– Both a text and a reference, as chapter material written by experts, but still contains worked examples, homework problems and illustrations.
– Authors/Editors are ULSI pioneers with extensive professional and academic experience.
– Both a text and a reference, as chapter material written by experts, but still contains worked examples, homework problems and illustrations.
– Authors/Editors are ULSI pioneers with extensive professional and academic experience.
