
Plasma Etching: An Introduction
Author(s): Dennis M. Manos (Editor), Daniel L. Flamm
- Publisher: Academic Press
- Publication Date: 8 Sept. 1989
- Language: English
- Print length: 476 pages
- ISBN-10: 0124693709
- ISBN-13: 9780124693708
Book Description
Editorial Reviews
Review
“[The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
–NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms“…They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
–Thomas M. MayerSANDIA NATIONAL LABORATORIES
“Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas.
–SOCIETY OF VACUUM COATERS
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