
Introduction to Semiconductor Manufacturing Technology 2nd Edition
Author(s): Hong Xiao (Author)
- Publisher: SPIE Press
- Publication Date: 15 Oct. 2012
- Edition: 2nd
- Language: English
- Print length: 704 pages
- ISBN-10: 081949092X
- ISBN-13: 9780819490926
Book Description
IC chip manufacturing processes, such as photolithography, etch, CVD, PVD, CMP, ion implantation, RTP, inspection, and metrology, are complex methods that draw upon many disciplines. Introduction to Semiconductor Manufacturing Technologies, Second Edition thoroughly describes the complicated processes with minimal mathematics, chemistry, and physics; it covers advanced concepts while keeping the contents accessible to readers without advanced degrees. Designed as a textbook for college students, this book provides a realistic picture of the semiconductor industry and an in-depth discussion of IC chip fabrication technology. The text focuses on current fabrication technologies, but older technologies are discussed for historical context.
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