CMOS Plasma and Process Damage

CMOS Plasma and Process Damage

CMOS Plasma and Process Damage

by: Kirk Prall (Author)

Publisher: Springer

Publication Date: 2025-06-17

Language: English

Print Length: 485 pages

ISBN-10: 3031890280

ISBN-13: 9783031890284

Book Description

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.

Editorial Reviews

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.

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