
CMOS Plasma and Process Damage
by: Kirk Prall (Author)
Publisher: Springer
Publication Date: 2025-06-17
Language: English
Print Length: 485 pages
ISBN-10: 3031890280
ISBN-13: 9783031890284
Book Description
This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.
Editorial Reviews
This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.
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